The production of optical waveguides by ion implantation: the case of rutile

With the purpose of developing optoelectronic devices, optical waveguides have been produced by ion implantation in many solids. The implantation process creates a damaged layer near the end of the ion trajectories, with a consequent reduction of density and index of refraction. This produces an optical barrier at a depth of a few microns, depending on the type of ion and its energy. The barrier and the surface constitute a planar waveguide. Rutile (TiO² tetragonal structure) single crystals were implanted with 7 MeV carbon ions using the Instituto de Fí­sica 3 MV Pelletron Accelerator, in the (100) and (001) directions, and Poly Allyl Diglycol Carbonate (PADC) as detection material. The waveguides were observed using the coupled prism technique, which indicated differences in the waveguides produced for different directions due to crystal anisotropy.

Detalles Bibliográficos

Autores principales:	Rickards,J., Trejo-Luna,R., Flores-Romero,E., Golzarri,J.I., Espinosa,G.
Formato:	Digital revista
Idioma:	English
Publicado:	Sociedad Mexicana de Física 2011
Acceso en línea:	http://www.scielo.org.mx/scielo.php?script=sci_arttext&pid=S0035-001X2011000700016
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