Plasma-Surface Interactions and Processing of Materials [electronic resource] /

An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.

Bibliographic Details

Main Authors:	Auciello, Orlando. editor., Gras-Marti, Alberto. editor., Valles-Abarca, Jose Antonia. editor., Flamm, Daniel L. editor., SpringerLink (Online service)
Format:	Texto biblioteca
Language:	eng
Published:	Dordrecht : Springer Netherlands, 1990
Subjects:	Chemistry., Physical chemistry., Chemical engineering., Nuclear physics., Heavy ions., Hadrons., Materials science., Industrial Chemistry/Chemical Engineering., Characterization and Evaluation of Materials., Nuclear Physics, Heavy Ions, Hadrons., Physical Chemistry.,
Online Access:	http://dx.doi.org/10.1007/978-94-009-1946-4
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